发明名称 PROCESS LIQUID SUPPLYING APPARATUS
摘要 PROBLEM TO BE SOLVED: To prevent a harmful result of forgetting to close a lid of an opening in a replenishing liquid tank which reserves a produced process liquid in a process liquid supplying apparatus constituting a photosensitive material processing apparatus. SOLUTION: The process liquid supplying apparatus is equipped with a tank to reserve a process liquid to be used to process a photosensitive material. The apparatus is equipped with: a lid member (502) attached as rotatable to cover the opening of the tank; and a regulating member (504) which regulates the rotation range of the lid member (502) in the opening direction so as to keep the top position (502') of the lid member (502) when it is opened to be above the rotation center (503). The lid member (502) is arranged in such a manner that the inner wall of an opening/closing door (501) presses the top end position (502') of the lid member (502) when it is opened in the closing direction (an arrow 508) by the closing operation of the door (501) covering the process liquid supplying apparatus. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005181716(A) 申请公布日期 2005.07.07
申请号 JP20030422861 申请日期 2003.12.19
申请人 NIDEC COPAL CORP 发明人 KATAGIRI KOICHI
分类号 G03D3/06;(IPC1-7):G03D3/06 主分类号 G03D3/06
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