发明名称 RESIST PATTERN FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To make the shrinkage quantity of an opening part constant irrelevantly to whether a resist pattern is fine or coarse by a method of reducing the opening part by baking the resist pattern having been formed and making resist flow. SOLUTION: This method includes: a stage (b) of coating a substrate to be processed with a resist layer 14, exposing the resist layer 14 by using a reticle 15 (a), and developing the resist layer 14 to form the pattern 14a, a stage (c) of forming an area 15 to be made to flow by lowering the glass transition temperature of resist resin on a side wall surface of the pattern 14a, and a stage (d) of obtaining a reduced opening part by making the flow area 16 flow by baking the pattern. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005181758(A) 申请公布日期 2005.07.07
申请号 JP20030423548 申请日期 2003.12.19
申请人 TOSHIBA CORP 发明人 MATSUNAGA KENTARO
分类号 G03F7/40;G03F7/20;H01L21/027;(IPC1-7):G03F7/40 主分类号 G03F7/40
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