| 摘要 |
PROBLEM TO BE SOLVED: To solve a problem such as insufficient suction holding of a substrate due to the entry of an immersion liquid to a substrate suction holding means or insufficient immersion exposure due to the drop of the immersion liquid. SOLUTION: An immersion exposure system wherein the pattern of an original plate is exposed over a substrate by means of a liquid layer between a projection optical system and the substrate is provided with a means to remove an immersion liquid adhered onto the substrate or filled thereon by turning or moving a substrate holding member. COPYRIGHT: (C)2005,JPO&NCIPI
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