发明名称 |
METHOD FOR MANUFACTURING SILICA GLASS USING MILLIMETER WAVE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing high-quality silica glass which contains neither bubbles nor foreign substances and have high homogeneity with a lesser distribution of OH groups etc., to a shape approximate to that of a final product. SOLUTION: The method for manufacturing the silica glass comprises heating and vitrifying a porous or powder molded article of silica by irradiating the powder molded article with the continuous or impulsive electromagnetic waves of millimeters or submillimeters in wavelength generated from a gyrotron or magnetron etc. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005179071(A) |
申请公布日期 |
2005.07.07 |
申请号 |
JP20030417501 |
申请日期 |
2003.12.16 |
申请人 |
UNIV OF FUKUI;TOSOH CORP;TOHOS SGM KK |
发明人 |
KOTO SEITARO;KUZUU SHIN;HORIKOSHI HIDEHARU;WAKAMATSU HIDETOSHI;IZUHARA TOSHITAKA;SEIGETSU HISANORI |
分类号 |
C03B19/06;(IPC1-7):C03B19/06 |
主分类号 |
C03B19/06 |
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