发明名称 |
Method and system for patterning material in a thin film device |
摘要 |
An aspect of the present invention is a method of patterning material in a thin-film device. The method includes forming a liftoff stencil, depositing a first layer of material through the liftoff stencil, depositing a second layer of material through the liftoff stencil, removing at least a portion of the liftoff stencil and performing a directional etch on the first and second layer of material.
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申请公布号 |
US2005148196(A1) |
申请公布日期 |
2005.07.07 |
申请号 |
US20030746170 |
申请日期 |
2003.12.26 |
申请人 |
SHARMA MANISH;ANTHONY THOMAS C.;LEE HOON |
发明人 |
SHARMA MANISH;ANTHONY THOMAS C.;LEE HOON |
分类号 |
H01L21/302;H01L21/461;H01L43/12;(IPC1-7):H01L21/302 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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