发明名称 |
Quality monitoring procedure for RF interface of radio communication device, involves analysis of first and second measurement values to provide monitored quality criterion of interface |
摘要 |
<p>A method for quality monitoring of RF interface of radio (RF) communication appliance (FKG) in which one or more first measurement values (ES1) of a first quality parameter (Q1) are measured at a first time point (TM1) by one or more measurement units (ME1), and in which one of or more second measurement values (ES2) of a second quality parameter are measured within an elapsed measurement time window (TNRG) by one or more second measurement units (ME2), and in which at least one first measured value (ES1) of the first quality parameter (Q1) and a second measured value (ES2) of the second quality parameter (Q2) are analyzed by an evaluation unit (AWE) and at least one monitoring criterion (KR) for the quality of the RF interface (FS) is generated from this. An independent claim is included for a communication appliance with quality monitoring function.</p> |
申请公布号 |
DE10356256(A1) |
申请公布日期 |
2005.07.07 |
申请号 |
DE2003156256 |
申请日期 |
2003.12.02 |
申请人 |
SIEMENS AG |
发明人 |
CHOI, HYUNG-NAM;ECKERT, MICHAEL;WUSCHKE, MARTIN |
分类号 |
H04L12/26;(IPC1-7):H04L12/26 |
主分类号 |
H04L12/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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