| 摘要 |
PROBLEM TO BE SOLVED: To perform removal of a water-repellent film and development processing by a common device and to cause no hindrance to waste liquid processing by segregating and processing waste liquid containing dissolved components of the water-repellent film and a liquid developer when a immersion exposed substrate is developed. SOLUTION: After processing liquid for dissolving the water-repellent film is supplied to the surface of the substrate after immersion exposure which is held by a substrate holding part to remove the water-repellent film, the liquid developer is supplied to this substrate. At this time, the liquid developer and the waste liquid containing protection-film dissolved components are separated and collected by a segregated collection means. In this case, the waste liquid which is different in waste liquid processing method can easily be segregated and collected, and no hindrance to the waste liquid processing is caused. COPYRIGHT: (C)2005,JPO&NCIPI |
