| 摘要 |
PROBLEM TO BE SOLVED: To provide a moisture removal apparatus and a substrate washing apparatus with excellent practicalness capable of surely removing moisture from whole the substrate surface by preventing concentration of moisture on a particular part of the substrate surface, and re-sticking of the removed moisture to the substrate. SOLUTION: This moisture removal apparatus is provided with a branch part 2 branched from a flowing part 1 where a fluid at a given flow velocity flows from one side to the other in a pipe; and a suction opening port 3 made to approach the surface of the substrate 4, at an end part 2a of the branch part 2. By making the flowing part 1 a decompressed state in relation to the branch part 2 by the fluid flowing through the flowing part 1 at the given velocity, a suction force is generated capable of sucking the moisture 5 attached to the surface of the substrate 4 from the opening port 3 into the branch part 2. COPYRIGHT: (C)2005,JPO&NCIPI
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