| 摘要 |
A radiation-sensitive resin composition which comprises an alicyclic olefin resin to which groups having aromatic groups and polar groups are attached, an acid generator, a crosslinking agent, and a solvent and which exhibits low permittivity and excellent flatness, transparency and solvent resistance and is excellent in resolution, retention of film thickness, pattern shape, and thermal discoloration resistance; a method for the formation of patterned resin films by the use of the composition; patterned resin films made by the method; and use of the films in electronic components.
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