发明名称 |
METHOD FOR IMPROVING THE HEAT STABILITY OF FILMS OF POLY-p-XYLYLENE OR DERIVATIVES THEREOF, AND POLY-p -XYLYLENE DERIVATIVES |
摘要 |
<p>A method for improving the heat stability of a film of poly-p-xylylene or a derivative thereof as represented by the general formula (1), which comprises forming a film through chemical deposition from a raw material prepared by mixing a (2.2)-paracyclophane represented by the general formula (2) with an amino-(2.2)-paracyclophane represented by the general formula (3) and by which the heat resistance of the film can be improved without impairing the deposition properties or the economic efficiency; and poly-p-xylylene derivatives improved in heat resistance: (1) [wherein X1 and X2 are each hydrogen, lower alkyl, or halogeno, and they may be the same or different from each other; and n is a degree of polymerization], (2) [wherein X1 and X2 are each the same as defined for the general formula (1)], and (3) [wherein X3 is hydrogen or lower alkyl; and Y1 and Y2 are each hydrogen or amino, with the proviso that both of Y1 and Y2 must be not hydrogen].</p> |
申请公布号 |
WO2005061576(A1) |
申请公布日期 |
2005.07.07 |
申请号 |
WO2003JP16371 |
申请日期 |
2003.12.19 |
申请人 |
DAISANKASEI CO., LTD.;MARUYAMA, HIROSHI;MOCHIZUKI, TSUTOMU;INOUE, TAKASHI |
发明人 |
MARUYAMA, HIROSHI;MOCHIZUKI, TSUTOMU;INOUE, TAKASHI |
分类号 |
C08G61/02;C08L65/04;(IPC1-7):C08G61/02 |
主分类号 |
C08G61/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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