LITHOGRAPHIC APPARATUS, ILLUMINATION SYSTEM, AND METHOD FOR PROVIDING PROJECTION BEAM OF EUV RADIATION

摘要

PROBLEM TO BE SOLVED: To provide a lithographic apparatus that is not influenced by problems caused by particles that are produced by the by-product of EUV radiation production. SOLUTION: The lithographic apparatus has an illumination system supplying a beam of radiation and a supporting structure supporting a patterning structure arranged. The patterning structure is formed to impart patterns to the cross section of the radiation beam. Moreover, the apparatus has a substrate support supporting a substrate and a projection system for projecting the patterned beam onto the target portion of the substrate. The illumination system has a radiation producing system of producing extreme ultraviolet radiation and a radiation collecting system of collecting extreme ultraviolet radiation arranged. The particles produced as the by-product of extreme ultraviolet radiation production move substantially in a particle movement direction. The radiation collecting system is regulated in such a manner as to collect the extreme ultraviolet radiation that radiates in the collecting direction that is largely different from the particle movement direction. COPYRIGHT: (C)2005,JPO&NCIPI