发明名称 METHOD FOR FORMING FILM, FILM, ELECTRONIC PART AND ELECTRONIC EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a method for forming a film capable of easily forming the film having a specified pattern at a low cost, the film formed by such a film forming method, an electronic part with the film and electronic equipment. SOLUTION: The method for forming the film has a precess in which a catalytic layer 6 containing a catalyst is formed on a base material 5; the process, in which a treatment in which the catalyst existing in film non-forming regions 9' excepting film forming regions 9 forming the film of the catalytic layer 6 does not function, is carried out; and the process in which the film is formed in the film forming regions 9 of the catalytic layer 6 by utilizing a catalytic function. It is preferable that the film is composed of a metallic film mainly constituted of a metallic material and a carbon film mainly constituted of a fibrous carbon substance. It is preferable that the fibrous carbon substance mainly comprises a carbon nanotube. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005183635(A) 申请公布日期 2005.07.07
申请号 JP20030421654 申请日期 2003.12.18
申请人 SEIKO EPSON CORP 发明人 SOGO TOMOHIKO;MIYAGAWA TAKUYA
分类号 C01B31/02;C23C16/26;H01L21/28;H01L21/288;H01L21/3205;H01L21/336;H01L29/786;H01L51/00;H01L51/05;H01L51/40;(IPC1-7):H01L21/320 主分类号 C01B31/02
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