发明名称 |
Composition for forming silicon film and method for forming silicon film |
摘要 |
There are provided a silicon-film-forming composition containing silicon particles and a dispersion medium and a method for forming a silicon film by forming a coating film of the silicon-film-forming composition on a substrate and subjecting the coating film to instantaneous fusion, a heat treatment or a light treatment. According to the composition and the method, a polysilicon film with a desired thickness which may be used as a silicon film for a solar battery can be formed efficiently and easily.
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申请公布号 |
US2005145163(A1) |
申请公布日期 |
2005.07.07 |
申请号 |
US20040515728 |
申请日期 |
2004.11.26 |
申请人 |
JSR CORP. |
发明人 |
MATSUKI YASUO;IWASAWA HARUO;KATO HITOSHI |
分类号 |
C23C24/10;C23C26/02;H01L21/208;(IPC1-7):C30B7/00;H01L21/44 |
主分类号 |
C23C24/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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