发明名称 Conductive material and method for filling via-hole
摘要 The conductive material comprises a first metal material having a melting point of not more than 250° C. and a second metal material having a melting point of not less than 500° C., and is paste at a temperature not more than 250° C. Whereby the conductive material can have much higher conductivity than the resin paste. The conductive material can be used in paste, whereby the conductive material can be buried in the via-hole in the same way as the resin paste.
申请公布号 US2005147522(A1) 申请公布日期 2005.07.07
申请号 US20050074729 申请日期 2005.03.09
申请人 FUJITSU LIMITED 发明人 WATANABE ISAO;HASHIMOTO KAORU;TANIGUCHI OSAMU
分类号 H05K1/09;H01B1/02;H01L21/283;H01L21/288;H01L21/768;H01L23/52;H05K1/03;H05K3/40;H05K3/46;(IPC1-7):C22C12/00;C22C28/00 主分类号 H05K1/09
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