| 发明名称 |
SLURRY FOR FLATTENING COLOR PHOTORESIST |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To prevent shade or scratches on a color photoresist surface in polishing of a color photoresist of a liquid crystal display panel. <P>SOLUTION: The color photoresist is polished by using slurry containing compound abrasive particles made of complex silicon oxide having a small diameter coated with an aluminum oxide. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
| 申请公布号 |
JP2005177970(A) |
申请公布日期 |
2005.07.07 |
| 申请号 |
JP20040104352 |
申请日期 |
2004.03.31 |
| 申请人 |
ETERNAL CHEMICAL CO LTD |
发明人 |
LEE CHIA-HAO;LIU WEN-CHENG;HUOH DENG-YANN |
| 分类号 |
B24B37/00;C09G1/02;C09K3/14;H01L21/302;H01L21/461;(IPC1-7):B24B37/00 |
主分类号 |
B24B37/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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