发明名称 PROCESS CONDITION MONITORING METHOD FOR SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a monitoring method for accurately estimating in advance the dispersion of electrical characteristics or circuit delay characteristics of the semiconductor device while utilizing RSF-based analysis. SOLUTION: Conditional data relating to a specification for manufacturing or designing a semiconductor device are selected as an input parameter of RSF, a characteristic relating to the specification for designing the semiconductor device is selected as the response parameter of an RSF, and an RSF library is constructed from the both. Afterwards, data which include the dispersion in manufacture corresponding to the conditional data relating to the specification are substituted to the RSF library, associated equations are created, and the associated equations are solved to calculate a statistical amount of the input parameter. The result of the statistical amount of the input parameter is fed back and compared to the variation width of input conditions which are set when the RSF library is created. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005183759(A) 申请公布日期 2005.07.07
申请号 JP20030424189 申请日期 2003.12.22
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 AIDA AKIHIKO;YAMASHITA KYOJI
分类号 H01L21/82;H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/82
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