发明名称 Method and system to compensate for lamp intensity differences in a photolithographic inspection tool
摘要 An after develop inspection tool considers tool-to-tool variability when determining confidence score for wafers under inspection. A golden wafer is used to calculate a RGB signature as well as the slope of the individual RGB curves for different lamp intensities. These slopes are normalized in order to generate a compensation factor for red values and blue values within a signature. When a wafer is subsequently inspected at an ADI station using a different lamp, the test wafer RGB signature is likely captured at a different lamp intensity. Consequently, when comparing the signatures, the golden wafer RGB signature is adjusted by the compensation factors, based on the different lamp's intensity setting, and this adjusted RGB signature is then used to determine whether a defect exists on the test wafer.
申请公布号 US2005146716(A1) 申请公布日期 2005.07.07
申请号 US20030749887 申请日期 2003.12.31
申请人 TOKYO ELECTRON LIMITED 发明人 DIXON DAVID;LEE LLOYD
分类号 G01N21/27;G01N21/93;G01N21/95;G01N21/956;(IPC1-7):G01N21/00 主分类号 G01N21/27
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