发明名称 |
Emitter for electron-beam projection lithography system and manufacturing method thereof |
摘要 |
An emitter for an electron-beam projection lithography (EPL) system and a manufacturing method therefor are provided. The electron-beam emitter includes a substrate, an insulating layer overlying the substrate, and a gate electrode including a base layer formed on top of the insulating layer to a uniform thickness and an electron-beam blocking layer formed on the base layer in a predetermined pattern. The manufacturing method includes steps of: preparing a substrate; forming an insulating layer on the substrate; forming a base layer of a gate electrode by depositing a conductive metal on the insulating layer to a predetermined thickness; forming an electron-beam blocking layer of the gate electrode by depositing a metal capable of anodizing on the base layer to a predetermined thickness; and patterning the electron-beam blocking layer in a predetermined pattern by anodizing. The emitter provides a uniform electric field within the insulating layer and simplify the manufacturing method therefor.
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申请公布号 |
US2005145835(A1) |
申请公布日期 |
2005.07.07 |
申请号 |
US20050057469 |
申请日期 |
2005.02.15 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
YOO IN-KYEONG;MOON CHANG-WOOK;JEONG SOO-HWAN;KIM DONG-WOOK |
分类号 |
G03F7/20;H01J1/312;H01J9/02;H01J37/06;H01J37/073;H01J37/305;H01L21/027;(IPC1-7):H01L29/06;H01L21/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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