METHOD OF AND ARRANGEMENT FOR REMOVING CONTAMINANTS FROM A SUBSTRATE SURFACE USING AN ATMOSPHERIC PRESSURE GLOW PLASMA
摘要
The present invention relates to a method of and arrangement for removing contaminants from a surface of a substrate by subjecting said substrate surface to an atmospheric pressure glow plasma. Said plasma is generated in a discharge space comprising a plurality of electrodes, by applying an alternating plasma energizing voltage to said electrodes causing a plasma current and a displacement current. Said plasma is stabilised by controlling caid displacement current during plasma generation such that modification of properties of said substrate surface is prevented.
申请公布号
WO2005062338(A1)
申请公布日期
2005.07.07
申请号
WO2004NL00897
申请日期
2004.12.22
申请人
FUJI PHOTO FILM B. V.;DE VRIES, HINDRIK, WILLEM;ALDEA, EUGEN;BOUWSTRA, JAN, BASTIAAN;VAN DE SANDEN, MAURITIUS, CORNELIUS, MARIA
发明人
DE VRIES, HINDRIK, WILLEM;ALDEA, EUGEN;BOUWSTRA, JAN, BASTIAAN;VAN DE SANDEN, MAURITIUS, CORNELIUS, MARIA