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发明名称
ION IMPLANTATION METHOD FOR SEMICONDUCTOR DEVICE
摘要
申请公布号
KR20050070689(A)
申请公布日期
2005.07.07
申请号
KR20030100526
申请日期
2003.12.30
申请人
DONGBUANAM SEMICONDUCTOR INC.
发明人
KIM, DAE KYEUN;JUNG, MYUNG JIN
分类号
H01L21/265;H01L21/425;H01L21/8238;(IPC1-7):H01L21/265
主分类号
H01L21/265
代理机构
代理人
主权项
地址
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