发明名称 WATER CLEANING SYSTEM AND WATER CLEANING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a water cleaning system capable of maintaining decomposition action of photocatalyst for a long period of time without depositing algae to the surface whereon photocatalyst is provided even using the system continuously, and a water cleaning method. <P>SOLUTION: The water cleaning system 1 has a water cleaning means 3 provided with a photocatalyst on the surface, a float 2 for holding the water cleaning means, a lift means 12 for lifting and lowering the water cleaning means 3 above and below water. The float means 12 hoists and lowers the water cleaning means 3 above and below the water surface, thereby preventing the deposition of algae on the surface whereon photocatalyst is provided. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005177700(A) 申请公布日期 2005.07.07
申请号 JP20030425737 申请日期 2003.12.22
申请人 TAIKO KINZOKU KK;IGAWA AKIRA;IGAWA KANTA 发明人 IGAWA AKIRA;IGAWA KANTA
分类号 C02F3/20;B01J35/02;C02F1/30;C02F1/72;C02F7/00;(IPC1-7):C02F1/30 主分类号 C02F3/20
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