发明名称 Material deposition system and a method for coating a substrate or thermally processing a material in a vacuum
摘要 Disclosed is a material deposition system for depositing material onto a surface of a substrate. The system includes a first body element with an interior cavity and an exit aperture extending through the first body element, and a second body element having an interior cavity and an exit aperture extending through the second body element. The interior cavity of the second body element contains the material, and the exit aperture of the second body element is spacially separated from and in fluid communication with the exit aperture of the first body element. The first body element and the second body element are rotatable, such that the exit apertures of the first body element and the second body element can be aligned and misaligned. A material deposition system with novel aperture spacing and separation and methods of coating a substrate and thermally processing a deposition material are also disclosed.
申请公布号 US2005147753(A1) 申请公布日期 2005.07.07
申请号 US20040009957 申请日期 2004.12.10
申请人 KURT J. LESKER COMPANY 发明人 SMITH GARY L.
分类号 C23C14/12;C23C14/24;(IPC1-7):C23C16/00 主分类号 C23C14/12
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