发明名称 RADIATION SENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high planarization performance, high sensitivity and high solvent resistance and ensuring high productivity. <P>SOLUTION: In the radiation sensitive resin composition comprising an alkali-soluble resin (A) having curability, a quinonediazido compound (B) and a solvent (C), &ge;40% by mass of the solvent (C) is ethyl lactate. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005181353(A) 申请公布日期 2005.07.07
申请号 JP20030401235 申请日期 2003.12.01
申请人 SUMITOMO CHEMICAL CO LTD 发明人 YAKO YOSHIKO
分类号 G03F7/032;G03F7/004;G03F7/033;G03F7/40;H01L21/027 主分类号 G03F7/032
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