| 摘要 |
PROBLEM TO BE SOLVED: To provide a device for preventing the internal face of the upper part of a chamber from being contaminated due to a sublimate generated from a substrate in the heat treatment of the substrate, and for preventing the sublimate from being re-attached to the surface of the substrate. SOLUTION: In this device for carrying out the heat treatment of a substrate by a hot plate 18 by housing a substrate W in a chamber 10, a jet nozzle 28 for supplying heating air to the chamber, and for making the heating air flow along the internal face of a top plate 16 is arranged at the upper part of one side face of the chamber where a loading/unloading port 12 is formed, and an exhaust nozzle 30 for exhausting the heating air supplied to the chamber by the jet nozzle is arranged at the upper part of the other side face faced to one side face where the jet nozzle is formed. COPYRIGHT: (C)2005,JPO&NCIPI
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