发明名称 MANUFACTURING METHOD OF HEAT TREATMENT APPARATUS AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To efficiently control gas exhaustion from a heater chamber while controlling temperature variance due to an outside temperature. SOLUTION: An outside temperature regulator 11 controls the heater power HP of a heater 9 for heating outside air to automatically regulate the outside air temperature so as to make the outside air temperature taken into the heater chamber 7 constant. An exhaust damper controller 17 automatically regulates the exhaust amount of an exhaust duct 12 so as to make the pressure of the exhaust gas from the heater chamber 7 constant. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005183596(A) 申请公布日期 2005.07.07
申请号 JP20030420963 申请日期 2003.12.18
申请人 SEIKO EPSON CORP 发明人 OTA TAKEJI
分类号 H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/02
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