发明名称 |
Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists |
摘要 |
A series structure of a chemically amplified negative tone photoresist that is not based on cross-linking chemistry is herein described. The photoresist may comprise: a first aromatic structure copolymerized with a cycloolefin, wherein the cycloolefin is functionalized with a di-ol. The photoresist may also include a photo acid generator (PAG). When at least a portion of the negative tone photoresist is exposed to light (EUV or UV radiation), the PAG releases an acid, which reacts with the functionalized di-ol to rearrange into a ketone or aldehyde. Then new ketone or aldehyde is less soluble in developer solution, resulting in a negative tone photoresist.
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申请公布号 |
US2005147916(A1) |
申请公布日期 |
2005.07.07 |
申请号 |
US20030750042 |
申请日期 |
2003.12.30 |
申请人 |
YUEH WANG;CAO HEIDI;CHANDHOK MANISH |
发明人 |
YUEH WANG;CAO HEIDI;CHANDHOK MANISH |
分类号 |
G03F7/038;(IPC1-7):G03C1/76 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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