FLUORINE-DOPED SILICATE GLASS AND ITS USE

摘要

PROBLEM TO BE SOLVED: To provide a material whose coefficient of thermal expansion is made as constant as possible so as to be particularly advantageously used in micro-lithography, in particular EUV(extreme-ultraviolet)-lithography.

SOLUTION: The fluorine doped at least ternary silicate glass contains in particular TiO2. The glass is constituted so as to be advantageously used as a material having a low thermal expansion, wherein the slope of the coefficient of thermal expansion is between ±2×109/K2in the temperature range of -50 to 100°C. This material is particularly suited for micro-lithography, in particular EUV-lithography.

COPYRIGHT: (C)2005,JPO&NCIPI