| 摘要 |
PROBLEM TO BE SOLVED: To provide physical development procedure conditions and a physical development procedure solution, with which a film of high conductivity can be stably obtained, in a manufacturing method of a transparent conductive film. SOLUTION: A photosensitive material having a physical development core layer and a silver halide emulsifiable applied on a transparent support body in this sequence is exposed, metallic silver is made deposited on the physical development core layer in an image form by a physical development procedure, and then, a layer provided on the physical development core layer is removed, in the manufacturing method of the transparent conductive film. The physical development is made with the physical development procedure solution containing bromide. COPYRIGHT: (C)2005,JPO&NCIPI |
