| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and efficiently preparing (monohalogen-substituted methyl) (adamantyl group-containing alkyl) ethers which are useful as modifiers for resins for photoresist in photolithography, dry etching resistance improvers, intermediates of agrochemicals and pharmaceutical drugs, other various industrial products, etc. while inhibiting production of by-products. SOLUTION: In the method, alcohols having adamantyl groups of formulae (I) and (I') (wherein Y is a 1-10C alkyl group, a 1-10C alkyl halide group, a halogen atom or a heteroatom-containing group; m is an integer of 0-15; and n is an integer of 0-10) are reacted with formaldehyde and a hydrogen halide gas to prepare the adamantane derivatives of formula (II) and (II') (wherein X is a halogen atom; and Y, m and n are as described above), respectively. Here, a solvent showing an aqueous solubility of≤5 mass% at a reaction temperature is used. COPYRIGHT: (C)2005,JPO&NCIPI
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