APPARATUS FOR THE COATING AND/OR CONDITIONING OF SUBSTRATES

摘要

The invention relates to apparatus and a method for the deposition and/or conditioning of coatings which are applied to substrates or a substrate which pass through the apparatus. The apparatus includes at least one coating material deposition means and a means for movement of the substrate to expose at least a portion of said substrate to the coating material in the coating chamber. Plasma generating means are provided and the said portion of substrate and coating material are exposed to the plasma. The coating material deposition means are provided to apply the said material in an atomised form into the coating chamber in which the plasma is generated and the deposited material is exposed to the plasma prior to and/or once applied to the said portion of the substrate. This allows the improved application of coating materials onto the substrates.