发明名称 |
Etching liquid composition |
摘要 |
The invention provides etching liquid compositions for transparent conducting films wherein foaming is suppressed and residues do not occur after etching. The etching liquid compositions include an etching liquid for transparent conducting films and one or more compounds selected from the group consisting of polysulfonic acid compounds and polyoxyethylene-polyoxypropylene block copolymers.
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申请公布号 |
US6914039(B2) |
申请公布日期 |
2005.07.05 |
申请号 |
US20010947483 |
申请日期 |
2001.09.06 |
申请人 |
KANTO KAGAKU KABUSHIKI KAISHA |
发明人 |
ISHIKAWA NORIO;MORI KIYOTO |
分类号 |
C23F1/14;C09K13/00;H01L21/3213;H01L31/18;(IPC1-7):C11D7/50;B08B3/08;H01L21/306 |
主分类号 |
C23F1/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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