| 发明名称 |
Lithographic apparatus, alignment method and device manufacturing method |
| 摘要 |
To align between layers having a large Z separation, an alignment system which illuminates reference markers with normally incident radiation is used. The alignment system has an illumination system that is telecentric on the substrate side. |
| 申请公布号 |
US6914664(B2) |
申请公布日期 |
2005.07.05 |
| 申请号 |
US20030365603 |
申请日期 |
2003.02.13 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BEST KEITH FRANK;FRIZ ALEXANDER;CONSOLINI JOSEPH J.;VAN BUEL HENRICUS WILHELMUS MARIA;GUI CHENG-QUN |
| 分类号 |
G01B11/00;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G03B27/42 |
主分类号 |
G01B11/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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