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发明名称
METHOD OF FABRICATING A SURFACE-ENLARGED GATE AND A SEMICONDUCTOR DEVICE THEREOF
摘要
申请公布号
KR100499158(B1)
申请公布日期
2005.07.01
申请号
KR20030012788
申请日期
2003.02.28
申请人
发明人
分类号
H01L29/78;H01L21/265;H01L21/28;H01L21/336;H01L29/423;(IPC1-7):H01L29/78
主分类号
H01L29/78
代理机构
代理人
主权项
地址
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