发明名称 Method for storage of a metal ion supply source in a plating equipment
摘要 To avoid change in plating performance, even where operation of the plating equipment is interrupted, the properties of the plating solution need to be preserved. For plating equipment having an insoluble anode, add a reservoir ( 7 ) for storing a replacement solution to the tank ( 4 ) having a metal ion supply source (copper ball ( 5 )) and, upon termination of the plating operation, the entire plating solution is discharged from the tank ( 4 ) containing the metal ion supply source, while the solution for replacement is transferred from the reservoir ( 7 ) to the empty tank having a metal ion supply source, and immediately prior to the resumption of the plating operation transfer the solution for replacement back to the reservoir ( 7 ) and return the plating solution to the tank ( 4 ) containing the metal ion supply source.
申请公布号 US2005139477(A1) 申请公布日期 2005.06.30
申请号 US20050502557 申请日期 2005.01.24
申请人 ATOTECH DEUTSCHLAND GMBH 发明人 MURANUSHI YOSHIHISA;SAITOH TADASHI
分类号 C25D21/00;C25D21/14;(IPC1-7):C25D21/18 主分类号 C25D21/00
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