Positioning device for positioning a positioning arrangement, e.g. for use in semiconductor microlithography, has a two-component measurement system for measuring movement differences and within an inertial reference system

摘要

Device for positioning a positioning arrangement relative to a support element using at least a provided measurement system. The measurement system comprises a measurement system for determining movement differences and a measurement system that measures relative to an intertial reference system and that is mounted on the positioning arrangement. The measurement system is used to determine actual position and to check the movement of the positioning arrangement. An independent claim is made for a positioning device for use in semiconductor lithography for measuring the actual position of and checking the movement of a positioning arrangement (2).