| 摘要 |
PROBLEM TO BE SOLVED: To provide an Al alloy film for a wiring film, which is applicable to a high-definition large-sized TV and such various flat display devices as to be processed in a low temperature, and has low resistance and high reliability, and to provide a sputtering target for forming the Al alloy film. SOLUTION: The Al alloy film for the wiring film comprises 0.2-1.5 atom% Ge and further 0.2-2.5 atom% Ni as additive elements, while controlling the total of the additive elements to 3.0 atom% or less, and the balance substantially Al. The sputtering target material for forming the wiring film comprises 0.2-1.5 atom% Ge and further 0.2-2.5 atom% Ni as additive elements, while controlling the total of the additive elements to 3.0 atom% or less, and the balance substantially Al. COPYRIGHT: (C)2005,JPO&NCIPI |
