| 摘要 |
PROBLEM TO BE SOLVED: To provide an excimer light irradiation apparatus in which temperature of a window part is uniformized and fluctuation of light quantity irradiated to an object to be irradiated is reduced in the excimer light irradiation apparatus at the window part of which a heater is provided in order to eliminate lowering of transmissivity due to adhesion of organic materials etc., onto the window face thereof. SOLUTION: In the excimer light irradiation apparatus, the window part transmitting excimer light is provided between an excimer lamp and the object to be irradiated and the heater for heating the window part is provided above the window part and further a conveying means which performs photoirradiation treatment while conveying the object to be irradiated is provided and an orientation pattern of the heater provided above the window part is formed in a direction nearly orthogonal to a conveying direction of the object to be irradiated or in a nearly oblique direction to the conveying direction of the object to be irradiated. When A denotes the conveying direction of the object to be irradiated and B denotes the direction orthogonal thereto, summation S of length of the deplayment pattern of the heater in A direction at each position in B direction of the object to be irradiated is made to satisfy that maximum of the sum S (Smax) is within 1.1 times average of the sum S (Save) in a width where the object to be irradiated is conveyed. COPYRIGHT: (C)2005,JPO&NCIPI
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