| 摘要 |
Disclosed herein are methods of forming a well in a semiconductor device, in which a well end point under a trench is formed deeper than other area by well implantation prior to trench filling and by which leakage current is minimized. In one example, the disclosed method includes forming a trench in a surface of a substrate to define a field area, forming a first conductive type well in a first active area of the substrate, forming a second conductive type well in a second active area of the substrate, and filling up the trench with a dielectric.
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