发明名称 LOW-REFLECTIVITY STRUCTURE AND METHOD OF MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To manufacture a low-reflectivity structure without restrictions on size by an easy method. <P>SOLUTION: An aluminum substrate 11 on the surface of which the film of porous alumina 12 having a plurality of micropores 12a produced by anodic oxidation is formed is manufactured, and micropores 12a are filled with SiO<SB>2</SB>13 up to a half depth from bottoms, and diameters of parts which are not filled with the SiO<SB>2</SB>13, of micropores 12a are expanded by pore widening treatment, and parts having diameters stepwise expanded by pore widening treatment are filled with the SiO<SB>2</SB>13, and the aluminum substrate in the bottoms is removed by iodine-methanol, and thus a low-reflectively structure 10 is manufactured. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005173120(A) 申请公布日期 2005.06.30
申请号 JP20030411971 申请日期 2003.12.10
申请人 FUJI PHOTO FILM CO LTD 发明人 MUKAI ATSUSHI
分类号 G02B1/11 主分类号 G02B1/11
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