发明名称 |
Lithographic apparatus and method of manufacturing a device and method of performing maintenance |
摘要 |
A lithographic apparatus includes an illumination system for providing a beam of radiation. The lithographic apparatus further includes: a support structure for supporting patterning device, the patterning device serving to impart the beam with a pattern in its cross-section; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic apparatus includes a vacuum system in which at least the illumination system and the substrate table are present. The vacuum system includes at least two separate vacuum modules. A first vacuum module includes at least the projection system and/or the illumination system. A second vacuum module includes the substrate table. At least two of the vacuum modules are connected to each other via a closable connection.
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申请公布号 |
US2005139784(A1) |
申请公布日期 |
2005.06.30 |
申请号 |
US20030744092 |
申请日期 |
2003.12.24 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BARTRAY PERTRUS R.;AMHAOUCH MUSTAFA;VAN ENGELEN ANGELO A.M.;LIEBREGTS PAULUS M.M.;MEESTERS TIM A.J. |
分类号 |
H01L21/027;H01J37/18;H01J37/30;(IPC1-7):H01J37/30 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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