发明名称 POLISHING PAD AND ITS MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a polishing pad hardly expanding/contracting in the outer diameter dimension. <P>SOLUTION: In the method of manufacturing the polishing pad with a small dimensional change, a polyurethane foam block for the polishing pad is formed and then sliced to form a polishing sheet which is cut to form the polishing pad. In this case, before cutting, the polishing sheet is left standing in an environment of a predetermined temperature and humidity for at least five hours. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005169570(A) 申请公布日期 2005.06.30
申请号 JP20030413591 申请日期 2003.12.11
申请人 TOYO TIRE & RUBBER CO LTD 发明人 KAZUNO ATSUSHI;WATANABE KIMIHIRO;NAKAMORI MASAHIKO;SHIMOMURA TETSUO;YAMADA TAKATOSHI
分类号 B24B37/20;B24B37/24;H01L21/304 主分类号 B24B37/20
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