| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for fabricating a substrate with a filter by which photolithography processes for a semitransmissive color filter is reduced by polishing the substrate. <P>SOLUTION: This method is applied to a semitransmissive liquid crystal display panel and includes: providing a substrate including a reflection area and a transmission area which are opposed to each other and then forming a color filter including a color part, a blank area, and a light shielding area on the substrate. Then the substrate is covered with a flat layer, the blank area is filled with it, and the flat layer is polished. Lastly, an electrode layer is formed on the color filter. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
