| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device which improves an exposure accuracy. SOLUTION: In the aligner, the temperature change of a reflecting mirror or a master surface at an exposure starting time is suppressed by preheating temperature regulating the reflecting mirror or the master surface by a radiation temperature regulating heater at the time of non-incidence of an exposure light to the reflecting mirror or the master disposed on an optical path of the exposure light from an exposure light source to a substrate to be exposed. The strain generation of the reflecting mirror or a master surface pattern is suppressed. Further, an aberration deterioration and the pattern strain generation of the master in association with the mirror temperature change at the exposure starting time are suppressed. Furthermore, the optical axis regulation or the aberration regulation in an equivalent state at the exposure starting time is performed by preheating temperature regulating the reflecting mirror by the radiation temperature regulating heater at the optical axis regulating time or the reflecting mirror aberration regulating time of a projection optical system, and the aberration deterioration and the pattern strain generation of the master in association with the mirror temperature change at the exposure starting time are suppressed. COPYRIGHT: (C)2005,JPO&NCIPI |
