| 摘要 |
PROBLEM TO BE SOLVED: To deposit a high reflection optical thin film having high reflectivity without the occurrence of a face change of an oxide substrate by establishing a deposition method capable of eliminating the "water molecules etc.," existing at the boundary between the oxide substrate and the high reflection optical thin film at a substrate temperature <200°C. SOLUTION: The method comprises the mechanism capable of positively removing the "water molecules etc.," hydrogen bonded to the "silanol group" formed on the surface of the oxide substrate containing SiO<SB>2</SB>just prior to the deposition under the conditions of the substrate temperature <200°C at the time of deposition and simultaneously removing the"water molecules etc.," and the "silanol group" from the surface of the oxide substrate containing the SiO<SB>2</SB>by progressing the dehydration/condensation reaction of the"silanol group". COPYRIGHT: (C)2005,JPO&NCIPI
|
