发明名称 |
METHOD AND DEVICE FOR FORMING METAL WIRING, CONDUCTIVE FILM WIRING, CONDUCTIVE FILM WIRING, THIN FILM TRANSISTOR, ELECTRO-OPTIC DEVICE, ELECTRONICS, AND NON-CONTACT CARD MEDIUM |
摘要 |
PROBLEM TO BE SOLVED: To provide a method and a device for forming wiring and conductive film wiring etc. that control occurrence of defect such like a breakdown or a short-circuit in wirings formed by an ink-jet method. SOLUTION: In this method, drops L1 and L2 composed of a liquid, in which conductive fine particles are dispersed in a dispersion medium, are spattered on a predetermined area of a substrate 11 to form wirings W1, W2, and W3. The method include a first arrangement process for arranging the drops L1 at an arrangement pitch H1 with which two adjacent drops L1 are not overlapped, a process for removing the dispersion medium of the drops L1, and a second arrangement process for arranging the drops L2 so that the spaces between drops L1 are occupied with them. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005175468(A) |
申请公布日期 |
2005.06.30 |
申请号 |
JP20040343137 |
申请日期 |
2004.11.26 |
申请人 |
SEIKO EPSON CORP |
发明人 |
HASEI HIRONOBU;HIRAI TOSHIMITSU |
分类号 |
B05D1/26;B05C5/00;B05C9/14;G09F9/00;H01L21/288;H01L21/3205;H01L21/336;H01L29/786;(IPC1-7):H01L21/320 |
主分类号 |
B05D1/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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