发明名称 METHOD OF FORMING DEPOSITION FILM, AND METHOD OF PRODUCING PHOTOVOLATIC SENSOR USING THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To form a deposition film having desired properties even after the maintenance of apparatuses in a method where the deposition film is formed using electrochemical reaction from an aqueous solution. <P>SOLUTION: In the method where a deposition film is formed using electrochemical reaction from an aqueous solution, a stage where an objective deposition film is formed under first deposition film forming conditions; a stage where at least a part of a member in contact with the aqueous solution is exchanged or depositions on the surface of the member are removed; and a stage where a deposition film is formed under second deposition film forming conditions are performed in this order, and thereafter, the objective deposition film is formed under the first deposition film forming conditions once more. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005171271(A) 申请公布日期 2005.06.30
申请号 JP20030408479 申请日期 2003.12.08
申请人 CANON INC 发明人 YAMADA SATOSHI;TOYAMA JO;HAYASHI SUSUMU;SONODA YUICHI;NISHIMOTO TOMONORI;IWATA MASUMITSU;MIYAMOTO YUSUKE;KONDO TAKAHARU
分类号 C25D9/08;C23C28/00;C23C28/04;C25D5/34;C25D5/48;H01L21/288;H01L31/04;(IPC1-7):C25D9/08 主分类号 C25D9/08
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