发明名称 REGENERATING PROCESSING DEVICE FOR WASTE PHOTORESIST DEVELOPER
摘要 PROBLEM TO BE SOLVED: To provide a regenerating processing device for a waste photoresist developer in which the problem of the quality failure of a regenerating developer does not occur even in an ON/OFF operating state, and even if a refinery such as CP or the like is installed at a latter stage, a problem of its load increase does not occur. SOLUTION: The regenerating processing device for the waste photoresist developer contains an isolating and recovering device (e.g., an NF film isolator or an electric dialyzer) at one stage or a multi-stage for isolating and recovering tetra-alkyl ammonium ions from the waste developer containing at least a photoresist and the tetra-alkyl ammonium ions, or a treating agent derived from the waste developer, and a mechanism for blowing an isolating and recovering agent from the one stage of the isolating and recovering device or the isolating and recovering agent from the multi-stage, at least the one stage to outside of this system, and/or a mechanism for returning it to a preceding stage of the isolating and recovering device. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005175118(A) 申请公布日期 2005.06.30
申请号 JP20030411490 申请日期 2003.12.10
申请人 JAPAN ORGANO CO LTD 发明人 SUGAWARA HIROSHI;TAJIMA YOSHINOBU
分类号 G03F7/30;B01D61/14;B01D61/44;B01D61/58;C02F1/44;C02F1/469;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/30
代理机构 代理人
主权项
地址