发明名称 |
APPARATUS AND METHOD FOR SUPPLYING COVERING GAS FOR MOLTEN METAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a apparatus for supplying covering gas for molten metal by which fluctuations in the concentration of effective components in the covering gas for molten metal can be suppressed. SOLUTION: This covering gas supplying apparatus has: a filling vessel 1 to be filled with a molten metal treating agent composed of a liquid mixture containing liquefied carbon dioxide and fluoroketone; a vaporizer 2 for vaporizing the molten metal treating agent to prepare vaporized gas; a vaporized gas pressure regulator 3 for keeping the pressure of the vaporized gas nearly constant; a vaporized gas flow regulating valve 4 for regulating the flow rate of the vaporized gas; a base gas supply part 5 to be a base gas supply source; a base gas pressure regulator 6 for keeping the pressure of the base gas nearly constant; a concentration detecting means 8 for detecting the fluoroketone concentration in the covering gas prepared by mixing the vaporized gas and the base gas; and a control part 11 for controlling the flow rate of the vaporized gas by regulating the opening of the vaporized gas flow regulating valve 4 on the basis of the detected value of the concentration detecting means 8. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005171374(A) |
申请公布日期 |
2005.06.30 |
申请号 |
JP20040013573 |
申请日期 |
2004.01.21 |
申请人 |
TAIYO NIPPON SANSO CORP |
发明人 |
SANAI HIROSHI;NOMURA YUJI;OTA HIDETOSHI |
分类号 |
B01J3/00;B01J4/02;C22B9/16;C22B26/22;F27D7/02;F27D7/06;(IPC1-7):C22B26/22 |
主分类号 |
B01J3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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