发明名称 Method for manufacturing NAND type nonvolatile ferroelectric memory cell
摘要 NAND type non-volatile ferroelectric memory cell and non-volatile ferroelectric memory of the same, in which numbers of access to a main cell and a reference cell are made the same, to maintain bitline induced voltages by the reference cell and by the main cell constant, for improving operation characteristics, minimizing a layout area, and permits a high density device integration, the memory cell including an N number of transistors connected in series, a bitline having an input terminal of a first transistor and an output terminal of (N)th transistor among the N number of transistors connected thereto, wordlines respectively connected to gates of the transistors except the (N)th transistor, a WEC signal line connected to a gate of the (N)th transistor and adapted to have an enable signal applied thereto only in a write or re-store mode, and ferroelectric capacitors respectively connected both to the wordlines and output terminals of the transistors.
申请公布号 US2005141259(A1) 申请公布日期 2005.06.30
申请号 US20050070304 申请日期 2005.03.03
申请人 HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. 发明人 KANG HEE B.
分类号 G11C14/00;G11C11/22;H01L21/8246;H01L21/8247;H01L27/10;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):G11C11/22 主分类号 G11C14/00
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