| 摘要 |
A method for fabricating a device is disclosed. The method includes providing a substrate; forming a thin film on the substrate; forming a photoresistable layer on the thin film; irradiating light onto the photoresistable layer through a photo mask having a transmissive region, a semi-transmissive region, a diffractive region and an interceptive region, and developing the photoresistable layer to form a photoresist pattern having at least three different thicknesses. With the above-described process, a liquid crystal display device (LCD), for example, can be manufactured using three photo masks.
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